NOVA Series 2 MHz RF Plasma Generators offer advanced RF plasma generation and control for low cost and high yield in the most demanding thin film processing applications
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Features & Benefits:
Auto-Frequency Tuning allows fixed matching networks - faster tuning and lower system cost.
Excellent Reliability - increased uptime and lower cost of ownership.
Automatic load mismatch protection guards against power amplifier over-dissipation from adverse loads
Unlimited load impedance range - more forward power "headroom" and stable power into any load.
Active front panel for full generator control.
Applications:
The NOVA RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, photovoltaic devices, flat panel displays, and data storage devices.
- 制造商: MKS Instruments
- 模型: NOVA-50A-04
